Preparation of Multicomponent Metal Nitrides (AxByNz) Through Advanced Single-Precursor Atomic Layer Deposition for Enhanced Supercapacitor Performance

• Applicant: Professor Dr. Sanjay Mathur
• Subject Area: Synthesis and Properties of Functional Materials
• Term: since 2024
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 551358134

Transition metal nitrides are imperative in supercapacitors due to their high electrical conductivity, excellent electrochemical stability, and mechanical strength. Additionally, their tunable surface chemistry and superior corrosion resistance make them ideal electrode materials for high-energy-density and long-lasting energy storage devices. Therefore, the development of transition metal nitride-based electrodes through advanced deposition techniques like atomic layer deposition (ALD) and plasma-enhanced chemical vapor deposition (PECVD) holds great promise for the advancement of supercapacitor technology. This research aims to develop ternary AxByNz nitrides (A and B = Fe, Co, Ni, Mo, and W) by using advanced metal-organic precursors in ALD and PECVD techniques to generate mono- and bimorphic metal nitride coatings for supercapacitor (SC) applications. Monometallic and bimetallic precursors containing M-N units will be synthesized and modified considering the chemical properties of metals (ionic radius, oxidation number, electronegativity, coordination number, etc.) and ligands (homoleptic/heteroleptic, size, ligand environment, etc.). The stability, volatility, and reactivity of the precursors will be investigated by thermogravimetric studies to assess their suitability for ALD and PECVD techniques. Selected precursors will be utilized in a supercycle ALD approach to deposit targeted AxByNz compositions. Bimetallic nitrides will be obtained by (i) sequential deposition of two individual precursors (ii) application of single molecule containing two different metals in ALD and PECVD techniques and (iii) combination of ALD and PECVD processes to fabricate films on metallic substrates, with bimorphic character to combine strongly adherent interface (ALD) with high surface area (PECVD). Film growth studies will focus on identifying the parametric space for testing efficiency of new precursors and to develop a hybrid ALD-PECVD approach for electrode deposition. The electrochemical performance of the resulting electrodes will be evaluated for SC applications. Additionally, postmortem analyses will be conducted to optimize and understand the role of microstructure and interfacial interaction within the thin-film structure and its impact on electrochemical properties.

• DFG Programme: Research Grants
• International Connection: South Korea
• Partner Organisation: National Research Foundation of Korea, NRF
• Cooperation Partner: Professor Dr. Do-Heyoung Kim