Nanoscale Optical Lithography Setup

• Subject Area: Systems Engineering
• Term: Funded in 2024
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 544668839

The Nanoscale Optical Lithography Setup (In the following NOLS) consists of several items and devices, which can be jointly utilized for realizing dielectric and metallic nano- and microstructures. The core item is a state-of-the-art mask-less optical lithography machine, which meets the following requirements: It allows to perform optical lithography on small- to large scale samples with structure sizes down to 600 nm. The machine’s high throughput and mask-less performance will make it highly suitable for integration in a shared user facility. The combination of a SML based system, which will facilitate direct ‘projection type’ sample illumination and laser-writing yields the desired versatility to define complex structures on smaller areas as well as on large areas. Multi-level alignment will be a critical ingredient in order to fabricate complex contacting schemes. Since one topical emphasize will be put on the technology of two-dimensional materials, we will heavily make use of the so-called ‘contact drawing’ option, which allows for literarily painting contact strips to small scale, flake like samples from global reference points. The lithography machine will be complemented by a spin-coater and a hot-plate for the resist bake-out. For contacting our sample, the setup will further comprise a wire-bonding apparatus.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Nanoskalig optisches Lithographie Setup
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Carl von Ossietzky Universität Oldenburg
• Leader: Professor Dr. Christian Schneider