Atomic Layer Deposition System

• Subject Area: Materials Science ; Materials Engineering
• Term: Funded in 2022
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 471301649

This proposal requests funding for purchasing an atomic layer deposition (ALD) system that is capable to handle substrates with a diameter of up to 200 mm. The ALD system will be used to deposit functional (e.g. multiferroic or memristive) oxides and nitrides, and catalytically active metals. These materials will be integral parts in novel electronic devices and circuits for application in information technology, photonics, micro-fluidics, and micro- and nanotechnology. ALD is the only technology that provides the specific deposition properties (including precise control of thickness and stoichiometry, conformal deposition, and low deposition temperature and energy) required to perform the planned cutting-edge research projects. The system will be operated by users based in the physics, electrical engineering and information technology, and bio-chemical engineering faculties. The ALD will thus take a key role in innovative research projects across faculties, and will lay the foundation for future interdisciplinary synergies.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Atomlagen-Depositions-Anlage
• Instrumentation Group: 0920 Atom- und Molekularstrahl-Apparaturen
• Applicant Institution: Technische Universität Dortmund
• Leader: Professor Dr.-Ing. Stefan Tappertzhofen