Plasma Enhanced Chemical Vapor Deposition

• Subject Area: Materials Engineering
• Term: Funded in 2020
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 455444208

The Institute of Semiconductor Technology is covering research activities from epitaxy of semiconductor nanostructures, chip processing and integration into systems for nanometrology. The infrastructure is available in the Epitaxy Competemce Center ec2, which is part of the institute. For the deposition of dielectric layers e.g. as isolation layers for microLED architectures of field effect transistors, as well as for optical layers in Bragg mirrors for laser diodes, a plasma deposition system is required. Focus of the reserach activities will be microLED reserach for Structured Micro Illumination Light Engines (SMILE) as well as 3-dimensional LED architectures. In addition, the plasma deposition will be available to all partner of LENA ("Laboratory for Emerging Nanometrology,"), the new reserach center for nanometrology reserach at TU Braunschweig.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Plasma Enhanced Chemical Vapor Deposition
• Instrumentation Group: 8330 Vakuumbedampfungsanlagen und -präparieranlagen für Elektronenmikroskopie
• Applicant Institution: Technische Universität Braunschweig
• Leader: Professor Dr. Andreas Waag