Low-pressure Chemical Vapour Deposition System

• Subject Area: Systems Engineering
• Term: Funded in 2021
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 450136577

For growing thin films with high optical quality a low pressure chemical vapour deposition (LPCVD) system is needed.To carry out planned research projects in nanophotonics and quantum photonics, as well as in materials physics, it is necessary to deposit custom silicon nitride and silicon dioxide thin film on a waferscale. Using LPCVD we plan to grow highly transparent thin films which will enable the creation of nanooptical structures with low loss. These devices will be employed for realizing optical resonators which will be used for quantum photonics, as well as for neuromorphic computing architectures. The system will be used in particular to grow multi-layer structures to enable new photonic circuits with 3D features.By installing the instrument in the center for soft nanoscience (SoN), the system will be made available to a broad user base. Planned research projects in nanophotonics, quantum photonics and interdisciplinary projects at the Münster Nanofabrication Facility will be carried out reproducibly with the new system and will generate synergies in SoN. The instrument will provide complementary nanoprocessing capability to current technologies and will be compatible with existing instrumentation.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Low-pressure Chemical Vapour Deposition System
• Instrumentation Group: 0920 Atom- und Molekularstrahl-Apparaturen
• Applicant Institution: Universität Münster
• Leaders: Professor Dr. Wolfram Hans Peter Pernice, until 12/2022; Professor Dr. Carsten Schuck, since 1/2023