Project Details
Projekt
ICP Plasma Etching System
Subject Area
Condensed Matter Physics
Term
Funded in 2019
Project identifier
Deutsche Forschungsgemeinschaft (DFG) - Project number 428016069
The ICP plasma etching system proposed here complements the infrastructure of the Quantum Optics group at Saarland University with a strongly required device for processing of micro- and nanostructures in diamond. Fabrication of such structures enables experiments on coupling of color centers in diamond to optical cavities in photonic crystal structures, on realization of spin-photon interfaces for color centers in diamond, and is required for fabrication of optical nano-antennas for color centers and for fabrication of scanning probe structures in diamond for magnetometry with high spatial resolution. These experiments can only be conducted given the fabrication platform provided by an ICP plasma etching system. Long term goals of the research topics mentioned here are both the exploration of fundamental effects of light-matter interaction at the level of single quantum systems and the supply of solid-state systems (such as color centers in diamond) and single photons for applications in quantum technologies. We strive for further development of new application potential, e.g. in fields of secure communication (quantum communication) or highly sensitive measurement technologies (quantum sensing). The latter fields are central columns of the new EU quantum technologies flagship and thus contribute to highly recent research topics.
DFG Programme
Major Research Instrumentation
Major Instrumentation
ICP-Plasma-Ätzanlage
Instrumentation Group
0910 Geräte für Ionenimplantation und Halbleiterdotierung
Applicant Institution
Universität des Saarlandes
