Direct-writing laser lithography system (DLLS)

• Subject Area: Condensed Matter Physics
• Term: Funded in 2019
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 427122702

The Nano Structuring Center is a core research facility at the TU Kaiserslautern and is run as a service center. It already has extensive equipment for micro- and nanostructuring of substrates and layers. The direct-writing laser-lithography system as proposed here is intended to bridge the gap between mask-using UV-photolithography and direct-writing electron beam lithography. With the application of maskless lithography via direct writing laser lithography of UV-sensitive photoresists, rapid prototyping of layered structures becomes possible. Also, for the first time at this institution, the production of 3-dimensional (3D) structures in photoresists or layers without the time- and cost-intensive production of grayscale or photolithographic masks becomes feasible. As a result of structures being written partially with electron beam and partially with laser lithography ("mix and match"), samples can be produced faster and less cost intensive.The Nano Structuring Center is applying for the laser-lithography system in a collaborative effort along with three other research groups from the departments of Physics and Electrical Engineering and Information Technology. The participating groups are conducting research in the fields of micro-optical devices, micro resonators and terahertz-based metamaterials as well as transverse-mode selection of semiconductor lasers and microfluidic micro lenses. Initially, these groups are intending to use the laser lithography system primarily for 'rapid prototyping' and, later on, also for the production of 3D structures directly in photoresists. After approval and installation of the laser lithography system, the Nano Structuring Center will carry out process development and optimization. Users of the system will be instructed accordingly and supported with the development and optimization of further processes. The necessary staff are permanently employed to the Nano Structuring Center with many years of experience in the fields of photo and electron beam lithography.

• DFG Programme: Major Research Instrumentation
• Major Instrumentation: Direktschreibendes Laser-Lithographie System (DLLS)
• Instrumentation Group: 0910 Geräte für Ionenimplantation und Halbleiterdotierung
• Applicant Institution: Rheinland-Pfälzische Technische Universität Kaiserslautern-Landau
• Leader: Professor Dr. Martin Aeschlimann