Multi frequency sputtering for deposition of ceramic layers (C01)

• Subject Area: Synthesis and Properties of Functional Materials
• Term: from 2010 to 2022
• Project identifier: Deutsche Forschungsgemeinschaft (DFG) - Project number 138690629

In sub-project C01, a large-area capacitvely coupled multi frequency discharge (MFCCP) is operated for deposition of ceramic layers as CrAlN and CrAlON. In phase 3, the research in C01 will focus on clarifying the effects of the plasma on the deposited film, on knowledge-based optimization of film characteristics, and on understanding basic plasma-surface-interactions that affect the plasma. Effects such as target poisoning can lead to drastical changes of surface coefficients such as the secondary electron emission coefficient (SEEC) and the sticking coefficient of different particle species, which are mostly unkown (absolute values and energy dependence). However, these coefficients are able to change serverly the plasma, sputtering, film growing and the process control. One of the tasks is to quantify the relevant surface coefficients using new in-situ simulation-based diagnostics in cooperation with the particle beam experiment in C07 to provide input paramters for the 2d3v-PIC simulations for benchmarking the MFCCP plasma.

• DFG Programme: CRC/Transregios
• Subproject of: TRR 87: Pulsed High Power Plasmas for the Synthesis of Nanostructural Functional Layers
• Major Instrumentation: Gegenfeldanalysator
• Instrumentation Group: 8710 Optische Längenmeßgeräte (außer 062-067 und Meßmikroskope 503)
• Applicant Institution: Ruhr-Universität Bochum
• Project Heads: Professor Dr.-Ing. Peter Awakowicz; Professor Dr. Julian Schulze, since 7/2018